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Surface Preparation and Analysis Technology:     ·System Ultra High Vacuum System(UHV System) UHV Scanning Probe Microscopy（UHV-SPM）{RT SPM、VT SPM、LT SPM、MFM、EFM} X-ray Photoelectron Spectroscopy（XPS）{ESCA+、NanoESCA} UHV Nano-scale Four-Probe Measurement System（NanoProbe） Multifunctional surface analysis system（SEM-SAM-STM） Low temperature measurement and analysis system（CFM、AFM、SNOM、CPS） Time-of-Flight Secondary Ion Mass Spectrometry（TOF-SIMS） Molecular Beam Epitaxy System（MBE） 　　·Components Electron Energy Analyzer Nano-scale Photoelectron Emission Microscopy（PEEM） Electron Source Ion Source X-ray Source and UV-light Source Reflection High Energy Electron Diffraction（RHEED） Low Energy Electron Diffraction（LEED） MBE Components Vacuum Components and Valves 　　Nanofabrication Technology: Raith E-Beam-Lithography System、Nanotechnology-stage and Pattern Generator     Nanoimprint technology UV-light Source and grating Nano positioning technology Nano-scale 3D Profile Measuring Instrument(3D Nanofinger) 　　Materials Analysis Technology: Broadband Dielectric and Impedance Spectrometers 　　The experimental samples: Standard nanoparticles Single-crystal metal、Sputter target、High-pure material……Nanoimprint Template、grattings     KELLER—Infrared Thermometers
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